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US Patent Issued to Tokyo Electron on Aug. 18 for "Inorganic/hybrid stress films" (New York Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,848, issued on Aug. 18, was assigned to Tokyo Electron Ltd. (Tokyo). "Inorganic/hybrid stress films" was invented by Charlotte Cutler (Alba... Read More


US Patent Issued to Applied Materials, National University of Singapore on Aug. 18 for "In situ acyclic diamino carbene (ADC) deposition" (Singaporean Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,849, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore). "In ... Read More


US Patent Issued to Applied Materials on Aug. 18 for "Carbon replenishment of silicon-containing material" (California Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,850, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Carbon replenishment of silicon-containing material"... Read More


US Patent Issued to Applied Materials on Aug. 18 for "Methods for patterning substrates to adjust voltage properties" (California Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,851, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods for patterning substrates to adjust voltage ... Read More


US Patent Issued to SK hynix, UIF (University Industry Foundation), Yonsei University on Aug. 18 for "Etching composition for selectively etching silicon nitride, etching method, and manufacturing method of semiconductor device using the same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,852, issued on Aug. 18, was assigned to SK hynix Inc. (Icheon, South Korea) and UIF (University Industry Foundation), Yonsei University (Seo... Read More


US Patent Issued to Applied Materials on Aug. 18 for "Oxide quality differentiation" (California Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,853, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Oxide quality differentiation" was invented by Lala ... Read More


US Patent Issued to Applied Materials on Aug. 18 for "Removal of organic material from high aspect ratio structures" (California Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,854, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Removal of organic material from high aspect ratio s... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Aug. 18 for "Semiconductor device and semiconductor manufacturing method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,855, issued on Aug. 18, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor device and semico... Read More


US Patent Issued to Tokyo Electron on Aug. 18 for "Plasma processing method and plasma processing system" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,856, issued on Aug. 18, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing method and plasma processing system" was invented b... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Aug. 18 for "Method for manufacturing semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,857, issued on Aug. 18, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Method for manufacturing semiconductor devic... Read More